Download Nanolithography and Patterning Techniques in by David G. Bucknall PDF

By David G. Bucknall

Nanolithography and Patterning options in Microelectronics examines the recent variety of thoughts that experience made it attainable to strengthen complicated styles on the nanoscale and explores their business purposes. This publication considers methods of forming and enhancing surfaces for patterning and gives details on particular patterning concepts equivalent to smooth lithography, ion beam patterning, use of nanostencils, photolithography, and inkjet printing. It additionally discusses prototyping and the manufacture of specific units. With a individual group of participants, this can be a great reference for researchers and execs utilizing complex polymers in such parts as microelectronics and biomedical units.

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Extra resources for Nanolithography and Patterning Techniques in Microelectronics

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A. , ‘Effect of unidirectional shear on the structure of triblock copolymers. 1. Polystyrene-polybutadiene-polystyrene’, Macromolecules, 1989 22(9) 3533–40. 85. , Mathis A. , ‘Synthesis of 3-block styrene-isoprenestyrene copolymer single-crystals via plane shear-flow’, Colloid. Polym. , 1979 257(2) 136–9. 86. , Gallot Y. , ‘Low-Angle neutron scattering study of the lateral extension of chains in lamellar styrene-isoprene block copolymers’, Macromolecules, 1982 15(2) 263–7. © 2005, Woodhead Publishing Limited 38 Nanolithography and patterning techniques in microelectronics 87.

3 25 Epitaxial patterning methods An effective way to produce a block copolymer thin film with long-range order is to create a periodic pattern on the substrate, which is then replicated by the block copolymer microdomain structure. The substrate pattern can be topographical, chemical, or both. This method essentially induces epitaxial self-assembly of the block copolymer; in such techniques, the block copolymer does not generate the pattern, but rather replicates a pre-existing pattern that must be produced by other methods.

Rev. Phys. Chem. 1990 41 525–57. 14. S. , ‘Block copolymers: Designer soft materials’, Physics Today February 1999 32–38. © 2005, Woodhead Publishing Limited 34 Nanolithography and patterning techniques in microelectronics 15. L. , ‘The gyroid: A new equilibrium morphology in weakly segregated diblock copolymers’, Macromolecules, 1994 27(15) 4063–75. 16. W. , ‘Unifying weak- and strong-segregation block copolymer theories’, Macromolecules, 1996 29(4) 1091–8. 17. M. , unpublished results. 18. W.

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