By David G. Bucknall
Nanolithography and Patterning options in Microelectronics examines the recent variety of thoughts that experience made it attainable to strengthen complicated styles on the nanoscale and explores their business purposes. This publication considers methods of forming and enhancing surfaces for patterning and gives details on particular patterning concepts equivalent to smooth lithography, ion beam patterning, use of nanostencils, photolithography, and inkjet printing. It additionally discusses prototyping and the manufacture of specific units. With a individual group of participants, this can be a great reference for researchers and execs utilizing complex polymers in such parts as microelectronics and biomedical units.
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Extra resources for Nanolithography and Patterning Techniques in Microelectronics
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3 25 Epitaxial patterning methods An effective way to produce a block copolymer thin film with long-range order is to create a periodic pattern on the substrate, which is then replicated by the block copolymer microdomain structure. The substrate pattern can be topographical, chemical, or both. This method essentially induces epitaxial self-assembly of the block copolymer; in such techniques, the block copolymer does not generate the pattern, but rather replicates a pre-existing pattern that must be produced by other methods.
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